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Information card for entry 1552235
Preview
| Coordinates | 1552235.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C72 H138 K2 N4 O12 Si9 Sn2 |
|---|---|
| Calculated formula | C72 H138 K2 N4 O12 Si9 Sn2 |
| Title of publication | Silicon Clusters with Six and Seven Unsubstituted Vertices via a Two-step Reaction from Elemental Silicon |
| Authors of publication | Schiegerl, Lorenz; Karttunen, Antti J.; Klein, Wilhelm; Fässler, Thomas F |
| Journal of publication | Chemical Science |
| Year of publication | 2019 |
| a | 31.6324 ± 0.0014 Å |
| b | 11.8423 ± 0.0007 Å |
| c | 25.7817 ± 0.0012 Å |
| α | 90° |
| β | 108.231 ± 0.003° |
| γ | 90° |
| Cell volume | 9173 ± 0.8 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 15 |
| Hermann-Mauguin space group symbol | C 1 2/c 1 |
| Hall space group symbol | -C 2yc |
| Residual factor for all reflections | 0.0978 |
| Residual factor for significantly intense reflections | 0.0444 |
| Weighted residual factors for significantly intense reflections | 0.0836 |
| Weighted residual factors for all reflections included in the refinement | 0.0997 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.928 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 217547 (current) | 2019-08-16 | cif/ Adding structures of 1552235, 1552236 via cif-deposit CGI script. |
1552235.cif |
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