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Information card for entry 1552236
Preview
| Coordinates | 1552236.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C60 H131 F K2 N4 O12 Si17 |
|---|---|
| Calculated formula | C60 H131 F K2 N4 O12 Si17 |
| Title of publication | Silicon Clusters with Six and Seven Unsubstituted Vertices via a Two-step Reaction from Elemental Silicon |
| Authors of publication | Schiegerl, Lorenz; Karttunen, Antti J.; Klein, Wilhelm; Fässler, Thomas F |
| Journal of publication | Chemical Science |
| Year of publication | 2019 |
| a | 16.4939 ± 0.0009 Å |
| b | 25.3561 ± 0.0017 Å |
| c | 22.6197 ± 0.0012 Å |
| α | 90° |
| β | 90.756 ± 0.004° |
| γ | 90° |
| Cell volume | 9459.2 ± 1 Å3 |
| Cell temperature | 150 ± 2 K |
| Ambient diffraction temperature | 150 ± 2 K |
| Number of distinct elements | 7 |
| Space group number | 7 |
| Hermann-Mauguin space group symbol | P 1 n 1 |
| Hall space group symbol | P -2yac |
| Residual factor for all reflections | 0.1411 |
| Residual factor for significantly intense reflections | 0.0729 |
| Weighted residual factors for significantly intense reflections | 0.1606 |
| Weighted residual factors for all reflections included in the refinement | 0.188 |
| Goodness-of-fit parameter for all reflections included in the refinement | 0.932 |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | Yes |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 217547 (current) | 2019-08-16 | cif/ Adding structures of 1552235, 1552236 via cif-deposit CGI script. |
1552236.cif |
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