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Information card for entry 1565018
Preview
| Coordinates | 1565018.cif |
|---|---|
| Original paper (by DOI) | HTML |
| Formula | C70 H94 B4 N4 O4 Si2 |
|---|---|
| Calculated formula | C70 H94 B4 N4 O4 Si2 |
| SMILES | B1(N(C=CN1c1c(C(C)C)cccc1C(C)C)c1c(C(C)C)cccc1C(C)C)[Si](=[Si](\B1N(C=CN1c1c(C(C)C)cccc1C(C)C)c1c(C(C)C)cccc1C(C)C)B1Oc2c(O1)cccc2)\B1Oc2c(O1)cccc2.C(CCC)CC |
| Title of publication | Isolation of a Planar 1,2-Dilithio-disilene and Its Conversion to Si−B Hybrid 2π-Electron System and a Planar Tetraboryldisilene |
| Authors of publication | Tian, Miao; Zhang, Jianying; Guo, Lulu; Cui, Chunming |
| Journal of publication | Chemical Science |
| Year of publication | 2021 |
| a | 14.9942 ± 0.001 Å |
| b | 11.7473 ± 0.0008 Å |
| c | 19.3646 ± 0.0011 Å |
| α | 90° |
| β | 93.326 ± 0.005° |
| γ | 90° |
| Cell volume | 3405.2 ± 0.4 Å3 |
| Cell temperature | 113.15 K |
| Ambient diffraction temperature | 113.15 K |
| Number of distinct elements | 6 |
| Space group number | 14 |
| Hermann-Mauguin space group symbol | P 1 21/n 1 |
| Hall space group symbol | -P 2yn |
| Residual factor for all reflections | 0.1968 |
| Residual factor for significantly intense reflections | 0.0824 |
| Weighted residual factors for significantly intense reflections | 0.1378 |
| Weighted residual factors for all reflections included in the refinement | 0.1858 |
| Goodness-of-fit parameter for all reflections included in the refinement | 1.011 |
| Diffraction radiation probe | x-ray |
| Diffraction radiation wavelength | 0.71073 Å |
| Diffraction radiation type | MoKα |
| Has coordinates | Yes |
| Has disorder | No |
| Has Fobs | No |
| Revision | Date | Message | Files |
|---|---|---|---|
| 270032 (current) | 2021-10-20 | cif/ Adding structures of 1565015, 1565016, 1565017, 1565018, 1565019 via cif-deposit CGI script. |
1565018.cif |
All data in the COD and the database itself are dedicated to the
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Users of the data should acknowledge the original authors of the
structural data.